IEEE

X-ray lithography: Part I—Design criteria for optimizing resist energy absorption; part II—Pattern replication with polymer masks

Abstract: An X-ray lithography system is analyzed in terms of maximizing the absorbed energy density in the resist. The individual factors, such as X-ray quantum efficiency, electron-beam energy, ...
C&EN

Growth Mechanism of Catalyst-Free and Mask-Free Heteroepitaxial GaN Submicrometer- and Micrometer-Sized Rods under Biaxial Strain: Variation of Surface Energy and Adatom Kinetics

† Department of Physics and Graduate School of Nanoscience & Technology (WCU), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, The Republic of Korea ‡ Graduate School of ...